Ion Beams-New Applications from Mesoscale to Nanoscale

Symposium II, "Ion Beams─New Applications from Mesoscale to Nanoscale," was held at the 2011 MRS Spring Meeting, April 25-29, in San Francisco, California. This symposium welcomed presentations on ion-beam engineering and characterization of materials properties, structure, topography, and functionality, spanning dimensions from the mesoscale to the nanoscale. While the unique capabilities of ion-beam techniques in the diverse emerging fields of nanoscience and nanotechnology are fast becoming critical for many new applications, the flexibility of ion-beam techniques now enables the development of new tools that can integrate tailoring of nanoscale patterns and structures with unique in-situ imaging and analysis. The recent evolution of such instrumentation has energized new programs, both basic and applied, in fast-developing areas ranging over advanced semiconductor integration, information storage, sensors, plasmonics, molecular engineering, biomaterials, and many aspects of the development of alternative energy resources. In a field displaying such rapid evolution on many fronts, it is appropriate for us to pause occasionally and review the overall state of the field, and its emerging opportunities and challenges.

Author: John Baglin

Publisher: Cambridge University Press

Publication Date: Nov 28, 2011

Number of Pages: 176 pages

Binding: Hardback or Cased Book

ISBN-10: 160511331X

ISBN-13: 9781605113319