
This book is the most comprehensive book on ion sources as part of ion implantation technology, a newly established basic technology for microelectronic device processing. It appeals to physicists, engineers and advanced students active in ion implantation and ion beam physics.
Author: Huashun Zhang |
Publisher: Springer |
Publication Date: Nov 08, 1999 |
Number of Pages: 476 pages |
Binding: Hardback or Cased Book |
ISBN-10: 3540657479 |
ISBN-13: 9783540657477 |